The 17th International Colloquium on Plasma Processes (CIP 09) will be held in
Marseille (France) on June 22-26, 2009.
CIP is a biennial international conference focussing on the latest developments in plasma
processing science and technology. It is a well-established international conference which
covers the whole area of plasma processes from fundamentals to applications. Special
attention is devoted to the understanding of plasma-surface interactions, and more
generally the relationship between the plasma parameters, the structural and functional
properties of the deposited films and plasma-treated surfaces as well as the development
and modelling of new plasma sources.
The aim of the conference is also to feature recent issues and challenges for plasma
processes in various industrial fields, such as microelectronics, micro-nanotechnology, aeronautics, mechanics, energy and environmental technology and life science.
Due to the proximity of Cadarache and the future International Thermonuclear Experimental
Reactor (ITER), CIP'09 proposes a new topic focused on low temperature plasmas for ITER.
The conference will include invited conferences, selected oral presentations and poster
sessions. The official language of the conference is English.
The CIP 09 Conference is preceded by three half-days (June 22-23) dedicated to short
courses on plasma science and technology.
CIP 09 is organized by the French Vacuum Society (SFV) and is coupled with SVTM 2009 (Salon du Vide et des Traitements des Matériaux / International Exhibition on Vacuum and
Surface Engineering) and the 37th A3TS Congress devoted to surface treatment.
Agnès GRANIER
Steering Committee Chairman
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