17th International Colloquium on PLASMA PROCESSES June 22-26, 2009 - Parc Chanot, Marseille (France)
INVITED LECTURES
(provisional)
•
The study of plasma chemistry in microplasma jets for thin film deposition
Jan Benedikt – Univ. Bochum (Germany)
•
Carbon erosion by aN ARGON-hydrogen plasma jet: a plasma spectroscopy study
Richard Engeln – Univ. Eindhoven (The Netherlands)
•
Thin films by means of homogeneous dielectric barrier discharges at atmospheric pressure
Nicolas Gherardi – LAPLACE, Toulouse (France)
•
Making flashes in bubbles in liquids
Bill Graham – Univ. Belfast (United Kingdom)
•
Application of low-pressure non equilibrium plasma discharges for sterilization and decontamination
of surfaces
Ondrej Kylian – Univ. Prague (Czech Republic)
•
Dusty plasmas: synthesis, structure and dynamics of a dust cloud in a plasma
Maxime Mikikian – GREMI, Orléans (France)
•
Transport of non-thermal deposition particles in an argon plasma at low pressures, in connection
with the thin film nanostructure
Alberto Palmero – CSIC, Sevilla (Spain)
•
Dry plasma processing for industrial c-Si solar cell production
Marc Hofmann – Fraunhofer Institut, Freiburg (Germany)
•
Interactions of plasma with carbon walls in magnetic fusion devices
Pascale Roubin – Univ. de Provence, Marseille (France)
•
Liquid-phase laser ablation plasmas and their applications
Koichi Sasaki – Nagoya Univ. (Japan)
•
Low temperature deposition of alumina thin films
Jochen Schneider – RWTH Aachen Univ. (Germany)
•
Studies of oxygen and chlorine atom recombination reactions on dynamic surfaces using a rotating substrate technique
Luc Stafford – Univ. Montréal (Québec, Canada)
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Fast silicon etching by negative ions Eugen Stamate – Technical Univ. of Denmark (Denmark)
•
High-power pulsed magnetron sputtering discharges: experiments and modelling
Jaroslav Vlcek – Univ. West Bohemia, Plzen (Czech Republic)
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