The 18th International Colloquium on Plasma Processes (CIP)
July 4th - July 8th, 2011
Nantes, France

CIP is a biennial international conference focusing on the latest developments in plasma processing science and technology.

The CIP topics cover the whole area of plasma processes from fundamentals to applications.
The aim of the conference is to feature the latest developments, recent issues and challenges for plasma processes in various industrial fields, such as: microelectronics, micro-nanotechnology, energy and environmental technology, the life sciences and plasma medicine.

The conference will include invited and contributed conferences given as lectures or as posters.

CIP 2011 is organized in connection with SVTM 2011 (International exhibition on Vacuum and Surface Engineering).