The "fifth international Conference on Innovations in Thin Films Processing and Characterisation" ITFPC 2011 and the second edition of "Magnetrons, Ion beam processing & Arc Technologies European Conference" MIATEC 2011 will be jointly held in Nancy (France) on November 14-17, 2011.

 

Both conferences are biennial and organised by the Société Française du Vide (SFV).
ITFPC conference series is co-organised with the Institut Jean Lamour (IJL) and MIATEC with BELVAC (Belgium Vacuum Society).

Besides the scientific topics covered by these join conferences, this event aims at providing an open forum to discuss on progresses and latest developments in thin film processing (etching, CVD and PVD) and engineering including nano-layer growth and properties, surface functionalisation, covering a wide field of applications in microelectronics, nanotechnology, mechanics, optics, photonics, chemistry, biology, medicine, etc. The Physical Vapor Deposition plasma processes and related techniques will be emphasized with particular focus on the new trends in IPVD magnetrons (Ionized Physical Vapor Deposition), HiPIMS (High Power Impulse Magnetron Sputtering), IBAD (Ion Beam Assisted Deposition), arc discharges, as well as fundamental research on the diagnostic and modelling of these processes.

The joint ITFPC-MIATEC 2011 rises as the high-technology meeting playing, as in the previous editions, the catalyst role for efficient exchanges between the academic and industrial fields contributing thus to technological transfers.


The conference will include invited plenary conferences, session conferences, selected oral presentations and poster sessions.

Important dates

November 14-17, 2011

Conference

 

November 14, 2011

Short courses

 

October 31, 2011

Deadline for reduced conference fees

 

September 2011

Acceptance notification

 

July 13, 2011

Deadline for abstract submission

 

April 26, 2011

Call for Papers

 

 

 

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