The thin film deposition by PVD (Physical Vapor Deposition) is being drastically improved since the last decade by the rise of novel technologies such as IPVDmagnetrons (Ionized Physical Vapor Deposition), HPPMS (High Power Pulsed Magnetron Sputtering), IBAD (Ion Beam Assisted Deposition), non equilibrium low current arc discharges, very high pressure arc discharges, overheat reduction of arcs etc. These technologies open the way for tailoring the film properties according to customer’s requirements and for environmental friendly processes compared to classical wet deposition ones.

This Conference continues the 5^th edition - Journées d‘études "Nouvelles tendances en procédés Magnétron et arc pour le dépôt de couches minces" (in French) in 2006 organised jointly by SFV (French Vacuum Society) and Belvac (Belgium Vacuum Society).

Taking into account the European dimension of the scientific and engineering community working in this area, it comes obvious that the next meeting – MIATEC 2010 – has to be the echo of their research and the catalyst for efficient exchanges between the academic and industrial fields thus contributing to technological transfers.

MIATEC 2010 work program is planned to be parallel with two others important meetings, taking place jointly, namely:

• SVTM – International Exhibition for Vacuum and Surface Engineering
• A3TS 2010 – 38^th Congress of Thermal Treatment and Surface Treatment

The official conference language is English, but the Tutorials preceding the conference are given in French.

Tiberiu MINEA
Chairman