"Atomic Layer Deposition in Long Capillaries, Counting Silanols on Fused Silica, Evaluating the XPS Peak Fitting and Accompanying Reporting in the Literature, and Uniqueness Plots in XPS "
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Abstract:
In this talk, I first discuss the deposition of ultrathin films by atomic layer deposition (ALD) in long, e.g., 12 m, capillaries that are typically used for gas chromatography (Anal. Chem. 2022, 94, 7483–7491 ). These depositions are performed in a home-built atmospheric pressure ALD system. Second, I will discuss a new tag-and-count method we have developed for quantifying/counting the number of silanols on silica surfaces (Applied Surface Science 2023, 607, 154551 ). This method consists of tagging the silanols with dimethylzinc by ALD and then counting the number of zinc atoms on the surface using high sensitivity - low energy ion scattering (HS-LEIS). We demonstrate this new approach using fused silica that is heated to different temperatures to control its silanol density. I then discuss some of our recent efforts to evaluate the quality of X-ray photoelectron spectroscopy (XPS) peak fitting in the literature (J. Vac. Sci. Technol. A 2020, 38, 061204 ). Unfortunately, we find that a significant fraction of the XPS data analysis in the literature is now significantly flawed. Finally, time permitting, I will discuss uniqueness plots in XPS (Applied Surface Science, 2016, 387, 155 – 162 ). These plots are used to identify fit parameter correlation in XPS peak fitting.
